ACCUSPIN® P-8545

ACCUSPIN phosphorus Spin-on dopants (P-8545 and P-854 2:1) are phosphorus doped silicon oxide polymers designed for n-type base diffusion, n-type emitter diffusion, solar cell doping and poly doping. ACCUSPIN phosphorous Spin-on dopants have been in large volume IC production for over 25 years.

The entire ACCUSPIN phosphorous Spinon family can be applied using standard spin coaters. ACCUSPIN phosphorus Spin-on dopants reduce the need for costly diffusion furnace tube cleaning or replacement required when using gas or liquid phosphorus dopants.

Because ACCUSPIN phosphorus Spinon dopants are phosphosilicate materials, diffusion is more uniform during the drivein process so sheet resistance and junction depths are repeatable. The use of a Spin-on process eliminates non-uniformity issues due to changes in gas flows of phosphorus sources or differing sheet resistance from placement in the diffusion furnace.

In addition, there are no customs and regulatory issues with importation or shipping of ACCUSPIN phosphorus Spin-on dopants; unlike the problems with shipping and importing POCl3.