Patterning Assistance Materials
Honeywell DUO™ 193
A silicon-rich BARC for single and dual damascene and other advanced patterning applications
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DUO193FS offers excellent plasma etch characteristics. The organo-siloxane polymer comprising DUO193FS provides a high degree of plasma etch selectivity to photoresist. Additionally, the organo-siloxane polymer allows for matched plasma etch selectivity to Low-k SiOCH and FSG dielectric films facilitating Dual Damascene patterning. Such plasma etch selectivity is required for exact transfer of the as patterned photoresist dimensions into the underlying thin films.
As requested by customers, DUO193FS is tuned to have a high strip rate in Low-k selective fluoride and amine based wet stripping chemistries. These strippers are designed to remove the inorganic BARC without damage to the underlying ILD.
General Information
- Application
- Anti-Reflective Coating (ARC)
- BARC
- Semiconductor Manufacturing
- Brand
- Honeywell
General Information
- Application
- Anti-Reflective Coating (ARC)
- BARC
- Semiconductor Manufacturing
- Brand
- Honeywell
- Application : Anti-Reflective Coating (ARC)|BARC|Semiconductor Manufacturing
- Brand : Honeywell