Patterning Assistance Materials
Honeywell SLAM™ 193e
A silicon-rich BARC for damascene and other advanced patterning applications
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Overview
- Gapfill + Mask + BARC: Low CoO
- First commercial SiBARC (130-5 nm)
Specifications
General Information
- Application
- Patterning
- Brand
- Honeywell
General Information
- Application
- Patterning
- Brand
- Honeywell
- Brand : Honeywell
- Application : Patterning
